Automatic IC/Wafer Laser Marking Machine
Key Features
✅ Wafer Handling:
- Supports FOUP loading via an advanced Loadport system
- Robot arm film transmission for smooth and precise wafer transfer
- Automatic calibrator for accurate wafer center & angle correction
✅ Marking & Identification:
- High-resolution laser marking for wafer edge ID (permanent & non-damaging)
- OCR recognition detection (optional) for automated verification
✅ Smart Automation & Connectivity:
- Automatic scanning for process efficiency
- SECS/GEM protocol support for seamless integration with customer’s factory system (Industry 4.0 ready)
✅ Clean-room Compatibility (Optional):
- FFU (Fan Filter Unit) air purification system for contamination control
- Smoke & dust collection & filtration system for a cleaner working environment

This fully automated, high-precision laser marking system ensures traceability, efficiency, and reliability in semiconductor production, meeting the stringent requirements of modern IC and wafer manufacturing.
Applications: Semiconductor wafer marking, IC packaging, MEMS, LED, and advanced electronics manufacturing.
For more details, customization, or a demo, feel free to contact us!
Features
- Replace the human labor and save labor cost.
- Simple and convenient operation, high speed and precise control.
- Realize the precise dispensing by the high-precision motor.
- High performance Linear structure platform with nice appearance.
- High-rigidity aluminum alloy multi-axis design ensures reliability and accuracy.
Advanced Software Capabilities
Font Support:
SEMI-compliant fonts:
5×9 (single-line density)
10×18 (double-line density)
Arabic font support for specialized marking requirements
Custom font integration (upon request)
Barcode & 2D Code Support:
BC-412 SEMI T1 barcode (industry-standard for wafer ID)
QR Code / Data Matrix (optional) for enhanced traceability
Custom marking layouts & symbol formats
Core Technical Parameters
| Category | Specification |
| Control System | Galvo scanning head + control card, Windows 7/10 OS |
| Laser Wavelength | 532nm (green laser for high-precision marking) |
| Cooling Method | Water-cooled / air-cooled (flexible configurations) |
| File Formats | DXF, PLT (compatible with CAD/design software) |
| Power Supply | Single-phase 220V, 4KW (excludes smoke/dust filter) |
Key Applications
✔ IC traceability & packaging (QR/Data Matrix for logistics)
✔ MEMS, LED, power devices (precision marking for small components)
Motion Performance
| Parameter | Specification |
| Movable Range | 315mm (linear) × 340° (rotation) × 300mm (Z-axis) |
| Average Speed | 570mm/sec (linear), 220°/sec (rotation), 200mm/sec (Z-axis) |
| Max Speed | 1140mm/sec (linear), 270°/sec (rotation), 250mm/sec (Z-axis) |
| Precision | <12.6µm (linear), <0.0045° (rotation), <6.25µm (Z-axis) |
| Repeatability | ±0.1mm |
| Handling Height | 620mm (base to wafer mounting surface) |
Wafer Compatibility
Supported Sizes:
Option 1: 2-4-6 inches
Option 2: 4-6-8 inches
Option 3: 8-12 inches
Special Wafer Handling: Customizable for non-SEMI shapes/materials.
Edge Finder & Alignment
| Parameter | Specification |
| Centering Time | ≤3 seconds |
| Position Accuracy | ±0.1mm (wafer center), ±0.1° (edge/gap) |
| Detection Method | LED lighting + image recognition sensors |
| Size Switching | Command control or communication protocol (SECS/GEM) |
Clean-room & Power Requirements
Cleanliness: ISO Class 2 (independent exhaust inside drive structure).
Power Supply:
Arm/Drive: DC24V ±10%, 16A
Stepper Motors: 2-phase, DC24V ±10%, 3A (controller embedded in body).
Vacuum: >-53kPa (Bernoulli suction cup: 0.5MPa compressed air).
Dust collector
| Parameter | Specification |
| Dimensions | 640 × 550 × 1322mm |
| Weight | 105kg |
| Max Airflow | 265m³/h |
| Max Negative Pressure | 230mbar |
| Power | 2.2kW, 220V/50Hz |
| Noise Level | 70±2dB |
| Filtration | ≥99% @0.3µm (manual cleaning with alarm reminder) |
Key Advantages
✅ High-Speed Precision: Sub-micron accuracy for critical wafer handling.
✅ Flexible Integration: Supports SEMI standards and factory automation (SECS/GEM).
✅ Cleanroom Ready: ISO Class 2 compliance with minimal particulate contamination.
✅ Scalable Solutions: Customizable for odd-shaped wafers and multi-size production lines.


