Leave Your Message


Automatic IC/Wafer Laser Marking Machine

The IC/Wafer Laser Marking Machine is a fully automated, high-precision solution designed for marking and identifying 8-12 inch bare wafers. It features advanced wafer handling, high-resolution laser marking, OCR recognition, and clean-room compatibility. With SECS/GEM protocol support, it seamlessly integrates into semiconductor manufacturing processes, ensuring traceability and efficiency.

    Key Features

    ✅ Wafer Handling:  
    - Supports FOUP loading via an advanced Loadport system  
    - Robot arm film transmission for smooth and precise wafer transfer  
    - Automatic calibrator for accurate wafer center & angle correction  

    ✅ Marking & Identification:  
    - High-resolution laser marking for wafer edge ID (permanent & non-damaging)  
    - OCR recognition detection (optional) for automated verification  

    ✅ Smart Automation & Connectivity:  
    - Automatic scanning for process efficiency  
    - SECS/GEM protocol support for seamless integration with customer’s factory system (Industry 4.0 ready)  

    ✅ Clean-room Compatibility (Optional):  
    - FFU (Fan Filter Unit) air purification system for contamination control  
    - Smoke & dust collection & filtration system for a cleaner working environment 

    2 (2).jpg

    This fully automated, high-precision laser marking system ensures traceability, efficiency, and reliability in semiconductor production, meeting the stringent requirements of modern IC and wafer manufacturing.  

    Applications: Semiconductor wafer marking, IC packaging, MEMS, LED, and advanced electronics manufacturing.  

    For more details, customization, or a demo, feel free to contact us! 

    Features

    1. Replace the human labor and save labor cost.
    2. Simple and convenient operation, high speed and precise control.
    3. Realize the precise dispensing by the high-precision motor.
    4. High performance Linear structure platform with nice appearance.
    5. High-rigidity aluminum alloy multi-axis design ensures reliability and accuracy.

    Advanced Software Capabilities

    Font Support:
    SEMI-compliant fonts:
    5×9 (single-line density)
    10×18 (double-line density)
    Arabic font support for specialized marking requirements
    Custom font integration (upon request)

    Barcode & 2D Code Support:
    BC-412 SEMI T1 barcode (industry-standard for wafer ID)
    QR Code / Data Matrix (optional) for enhanced traceability
    Custom marking layouts & symbol formats

    Core Technical Parameters

    Category

    Specification

    Control System

    Galvo scanning head + control card, Windows 7/10 OS

    Laser Wavelength

    532nm (green laser for high-precision marking)

    Cooling Method

    Water-cooled / air-cooled (flexible configurations)

    File Formats

    DXF, PLT (compatible with CAD/design software)

    Power Supply

    Single-phase 220V, 4KW (excludes smoke/dust filter)

    Key Applications

    ✔ Wafer ID marking (SEMI-compliant alphanumeric/barcodes)
    ✔ IC traceability & packaging (QR/Data Matrix for logistics)
    ✔ MEMS, LED, power devices (precision marking for small components)
    Robotic Arm & Wafer Handling System Technical Specifications

    Motion Performance

    Parameter

    Specification

    Movable Range

    315mm (linear) × 340° (rotation) × 300mm (Z-axis)

    Average Speed

    570mm/sec (linear), 220°/sec (rotation), 200mm/sec (Z-axis)

    Max Speed

    1140mm/sec (linear), 270°/sec (rotation), 250mm/sec (Z-axis)

    Precision

    <12.6µm (linear), <0.0045° (rotation), <6.25µm (Z-axis)

    Repeatability

    ±0.1mm

    Handling Height

    620mm (base to wafer mounting surface)

    Wafer Compatibility

    Supported Sizes:
    Option 1: 2-4-6 inches
    Option 2: 4-6-8 inches
    Option 3: 8-12 inches
    Special Wafer Handling: Customizable for non-SEMI shapes/materials.

    Edge Finder & Alignment

    Parameter

    Specification

    Centering Time

    ≤3 seconds

    Position Accuracy

    ±0.1mm (wafer center), ±0.1° (edge/gap)

    Detection Method

    LED lighting + image recognition sensors

    Size Switching

    Command control or communication protocol (SECS/GEM)

    Clean-room & Power Requirements

    Cleanliness: ISO Class 2 (independent exhaust inside drive structure).
    Power Supply:
    Arm/Drive: DC24V ±10%, 16A
    Stepper Motors: 2-phase, DC24V ±10%, 3A (controller embedded in body).
    Vacuum: >-53kPa (Bernoulli suction cup: 0.5MPa compressed air).

    Dust collector

    Parameter

    Specification

    Dimensions

    640 × 550 × 1322mm

    Weight

    105kg

    Max Airflow

    265m³/h

    Max Negative Pressure

    230mbar

    Power

    2.2kW, 220V/50Hz

    Noise Level

    70±2dB

    Filtration

    ≥99% @0.3µm (manual cleaning with alarm reminder)

    Key Advantages

    ✅ High-Speed Precision: Sub-micron accuracy for critical wafer handling.
    ✅ Flexible Integration: Supports SEMI standards and factory automation (SECS/GEM).
    ✅ Cleanroom Ready: ISO Class 2 compliance with minimal particulate contamination.
    ✅ Scalable Solutions: Customizable for odd-shaped wafers and multi-size production lines.